Plasma-enhanced chemical vapour deposition of AlN coatings on graphite substrates
- 1 February 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 146 (3), 255-264
- https://doi.org/10.1016/0040-6090(87)90432-9
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Oxidation Resistance of AlN Coated Graphite Prepared by Plasma Enhanced CVDJournal of the Ceramic Association, Japan, 1986
- Composition, Kinetics, and Mechanism of Growth of Chemical Vapor‐Deposited Aluminum Nitride FilmsJournal of the Electrochemical Society, 1982
- Epitaxial Growth of Aluminum Nitride on Sapphire Using Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1981
- Titanium nitride deposition in an r.f. dischargeJournal of the Less Common Metals, 1980
- Thermodynamics and Kinetics of Chemical Vapor Deposition of Aluminum Nitride FilmsJournal of the Electrochemical Society, 1980
- Optical properties of aluminium nitride prepared by chemical and plasmachemical vapour depositionPhysica Status Solidi (a), 1977
- Chemical and plasmachemical vapour deposition of aluminium nitride layersCrystal Research and Technology, 1976
- The Preparation and Properties of Aluminum Nitride FilmsJournal of the Electrochemical Society, 1975
- The Use of Metalorganics in the Preparation of Semiconductor MaterialsJournal of the Electrochemical Society, 1971
- Epitaxial growth of aluminum nitrideSolid-State Electronics, 1967