Electron-cyclotron-resonance plasma-assisted radio-frequency-sputtered strontium titanate thin films
- 1 December 1993
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 74 (11), 6851-6858
- https://doi.org/10.1063/1.355086
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
- Preparation of strontium titanate thin film on Si substrate by radio frequency magnetron sputteringJournal of Vacuum Science & Technology A, 1992
- Reactive Coevaporation Synthesis and Characterization of SrTiO3 Thin FilmsJapanese Journal of Applied Physics, 1991
- SrTiO3 Thin Film Preparation by Ion Beam Sputtering and Its Dielectric PropertiesJapanese Journal of Applied Physics, 1991
- Cross-Sectional Tem Studies of Barium Strontium Titanate Deposited on Silicon by Pulsed Laser AblationMRS Proceedings, 1991
- Interface Structure and Dielectric Properties of SrTiO3 Thin Film Sputter-Deposited onto Si SubstratesMRS Proceedings, 1990
- Electron cyclotron resonance plasma stream source for plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1989
- Memory cell and technology issues for 64- and 256-Mbit one-transistor cell MOSD DRAMsProceedings of the IEEE, 1989
- An electron cyclotron resonance plasma stream source for low pressure thin film productionSurface and Coatings Technology, 1988
- An electron cyclotron resonance plasma deposition technique employing magnetron mode sputteringJournal of Vacuum Science & Technology A, 1988
- Some Electrical Properties of Strontium TitanatePhysical Review B, 1953