Electron beam lithography using chemically-amplified resist: Resolution and profile control
- 31 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4), 305-308
- https://doi.org/10.1016/0167-9317(95)00251-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- New microlithography technologies based on resist irradiation by low energy electronsMicroelectronic Engineering, 1994
- Relationship between remaining solvent and diffusion of acid in chemical amplification resists.Journal of Photopolymer Science and Technology, 1994
- Multilayer resists with variable layer parameters for submicron lithographyMicroelectronic Engineering, 1990