In-situ emissivity and temperature measurement during rapid thermal processing (RTP)
- 1 January 1992
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Emissivity of silicon wafers during rapid thermal processingPublished by SPIE-Intl Soc Optical Eng ,1991
- A self-aligned cobalt silicide technology using rapid thermal processingJournal of Vacuum Science & Technology B, 1986
- Spectral Emissivity of SiliconJapanese Journal of Applied Physics, 1967