Measurement of the Distribution of Phosphorus Diffused in Silicon Dioxide Film Using 32P as a Tracer
- 1 March 1967
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 6 (3), 410
- https://doi.org/10.1143/jjap.6.410
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Effect of Oxide Layers on the Diffusion of Phosphorus into SiliconJournal of Applied Physics, 1960
- Diffusion of phosphorus in silicon oxide filmJournal of Physics and Chemistry of Solids, 1959