Residual stress in protective ZrO2 coatings produced by magnetron sputtering
- 1 October 1994
- Vol. 45 (10-11), 1047-1050
- https://doi.org/10.1016/0042-207x(94)90019-1
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Energy deposition and substrate heating during magnetron sputteringVacuum, 1993
- Non-destructive characterization of plasma-sprayed ZrO2 coatings by ultrasonic surface wavesThin Solid Films, 1993
- Optical properties of ion assisted deposited zirconia thin filmsJournal of Vacuum Science & Technology A, 1992
- Residual stress and adhesion of molybdenum coatings produced by magnetron sputteringVacuum, 1992
- Origin of gas impurities in sputtering plasmas during thin film depositionVacuum, 1991
- Crystallographic and optical study of ZrO2 partially and totally stabilized with Y2O3Journal of Vacuum Science & Technology A, 1990
- Structural stability of ZrO2–Al2O3 thin films deposited by magnetron sputteringJournal of Vacuum Science & Technology A, 1989
- Stress-related effects in thin filmsThin Solid Films, 1989
- Oxidation induced stresses and some effects on the behavior of oxide filmsJournal of Applied Physics, 1983
- The origins of stress in thin nickel filmsThin Solid Films, 1972