Low energy electron beam lithography: Pattern distortion by charge trapped in the resist
- 28 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4), 165-168
- https://doi.org/10.1016/s0167-9317(96)00082-2
Abstract
No abstract availableKeywords
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- Metrology of high-resolution resist structures on insulating substratesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- A study of deposited charge from electron beam lithographyJournal of Vacuum Science & Technology B, 1990
- Charging effects from electron beam lithographyJournal of Vacuum Science & Technology B, 1989