R.F. magnetron sputtered tungsten carbide thin films
Open Access
- 1 June 1986
- journal article
- Published by Springer Nature in Bulletin of Materials Science
- Vol. 8 (3), 379-384
- https://doi.org/10.1007/bf02744149
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- XPS, AES and friction studies of single-crystal silicon carbideApplications of Surface Science, 1982
- Internal stress in aluminium oxide, titanium carbide and copper films obtained by planar magnetron sputteringThin Solid Films, 1981
- Preparation of titanium nitride by a pulsed d.c. magnetron reactive deposition techniques using the moving mode of depositionThin Solid Films, 1980