200 kV Mass-Separated Fine Focused Ion Beam Apparatus
- 1 July 1985
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 24 (7A), L566
- https://doi.org/10.1143/jjap.24.l566
Abstract
A 200 kV mass-separated focused ion beam apparatus using alloy liquid metal ion sources has been developed. Focusing characteristics have been estimated by scanning ion microscope images of the metal mesh and the sputter etching pattern fabricated by the focused ion beam. A beam diameter smaller than 80 nm was obtained for Ga+ with 100 pA at 200 kV.Keywords
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