Thermal Donor Formation in Pre-Heat-Treated n-Si:O Crystals
- 16 February 1989
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 111 (2), K149-K154
- https://doi.org/10.1002/pssa.2211110240
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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- New Donor Formation in n-Type Czochralski-Grown SiliconJapanese Journal of Applied Physics, 1985
- Kinetics of thermal donor generation in siliconJournal of Applied Physics, 1984
- Oxygen-related thermal donors in silicon: A new structural and kinetic modelJournal of Applied Physics, 1984