Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target
- 1 November 1999
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 17 (6), 3317-3321
- https://doi.org/10.1116/1.582059
Abstract
No abstract availableKeywords
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