The effects of annealing upon the accumulation of amorphousness in a composite model of disorder production
- 1 January 1981
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 59 (1-2), 69-76
- https://doi.org/10.1080/00337578108244199
Abstract
A composite model for amorphousness production in which simultaneous damage annealing is allowed during ion irradiation of semiconductors is presented. Numerical calculations using this model indicate that dose rate effects may be observable under certain favourable conditions thus giving some indication as to the disordering mechanism leading to amorphous production.Keywords
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