Laser enhanced etching in KOH
- 15 February 1982
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 40 (4), 352-354
- https://doi.org/10.1063/1.93069
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Laser chemical technique for rapid direct writing of surface relief in siliconApplied Physics Letters, 1981
- Multiple photon excited SF6 interaction with silicon surfacesThe Journal of Chemical Physics, 1981
- Laser-photoinduced etching of semiconductors and metalsApplied Physics Letters, 1980
- Infrared laser induced reaction of SF6 with silicon surfacesThe Journal of Chemical Physics, 1980
- Laser enhanced electroplating and maskless pattern generationApplied Physics Letters, 1979
- Anisotropic etching of siliconIEEE Transactions on Electron Devices, 1978