Nucleation of Microcrystallites in Phosphorus-Doped Si:H Films
- 1 February 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (2), L121
- https://doi.org/10.1143/jjap.20.l121
Abstract
Structural properties of partially crystallized Si:H films prepared by glow discharge technique have been studied by Raman scattering and optical absorption spectra. The structure of the Si:H films is found to be a mixture of microcrystalline and amorphous phases. The volume fraction of a microcrystalline part in the Si:H network was determined to be 0.37–0.58 on the basis of the effective-medium theory.Keywords
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