Use of carbon-free Ta2O5 thin-films as a gate insulator
- 30 June 1997
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 36 (1-4), 61-64
- https://doi.org/10.1016/s0167-9317(97)00015-4
Abstract
No abstract availableKeywords
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