Influence of surface fluorination on the oxidation of amorphous silicon by atomic oxygen at 300 K
- 1 December 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 43 (1-4), 292-296
- https://doi.org/10.1016/0169-4332(89)90227-4
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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