XPS study of the oxidation process of Si(111) via photochemical decomposition of N2O by an UV excimer laser
- 31 January 1988
- journal article
- Published by Elsevier in Surface Science
- Vol. 193 (3), 321-335
- https://doi.org/10.1016/0039-6028(88)90439-6
Abstract
No abstract availableKeywords
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