The post-hydrogenation of low-pressure chemical vapor deposited amorphous silicon
- 1 March 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 54 (3), 199-205
- https://doi.org/10.1016/0022-3093(83)90065-0
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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