Observation of deep levels associated with the GaAs/AlxGa1−xAs interface grown by molecular beam epitaxy

Abstract
We report the first direct observation of deep levels associated with the n‐GaAs/N‐Al0.25Ga0.75As heterointerface in a double heterostructure (DH) laser grown by molecular beam epitaxy (MBE). The concentration of these states in a nonoptimum device having a high threshold current density is 3×1010 cm−2. The states have an average energy of Ec−0.66 eV and appear to be localized in the n‐GaAs within 140 Å of the interface. The relationship of these states to the laser threshold is discussed.

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