Elimination of the 16O2+ effect in backscattering studies of thin film reactions
- 1 December 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 47 (3), L5-L7
- https://doi.org/10.1016/0040-6090(77)90052-9
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- An effect of poor vacuum conditions on the analysis of thin films by Rutherford backscatteringThin Solid Films, 1975
- Kinetics of silicide formation by thin films of V on Si and SiO2 substratesJournal of Applied Physics, 1974
- 16O contamination in 4He analysis beamsThin Solid Films, 1973
- LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUMApplied Physics Letters, 1971