Production mechanism and reactivity of the SiH radical in a silane plasma
- 15 February 1984
- journal article
- Published by Elsevier in Chemical Physics
- Vol. 84 (2), 281-293
- https://doi.org/10.1016/0301-0104(84)85213-1
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- Detection of Neutral Species in Silane Plasma Using Coherent Anti-Stokes Raman SpectroscopyJapanese Journal of Applied Physics, 1983
- Rotational dependence of Franck-Condon factors for OH+, NH+, SiH, MgH+, SiH+, and NO+Journal of Quantitative Spectroscopy and Radiative Transfer, 1982
- Collision transfers between BH, A 1Π, v′ = 0 rotational states, induced by He, Ar, or H2 : ExperimentsThe Journal of Chemical Physics, 1982
- A study of the silane glow discharge deposition by isotopic labellingThin Solid Films, 1981
- Emission spectroscopy of glow-discharge and sputtering plasmas used in amorphous Si:H film depositionJournal of Vacuum Science and Technology, 1980
- Plasma spectroscopy control and analysis of a-Si:H depositionJournal of Non-Crystalline Solids, 1980
- Molecular dissociation by electron impact: High Rydberg fragments from methane, ethylene, and ethaneThe Journal of Chemical Physics, 1977
- Kinetics of the thermal decomposition of methyldisilane and trisilaneJournal of the American Chemical Society, 1975
- The true potential energy curves and Franck-Condon factors of SiH and SiH+ moleculesPhysica, 1971
- THE SPECTRUM OF SILICON HYDRIDECanadian Journal of Physics, 1957