Maskless ion implantation system for three-dimensional fine doping structures in III–V compound semiconductors
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 21 (1-4), 104-111
- https://doi.org/10.1016/0168-583x(87)90806-8
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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