Growth and properties of alumina films obtained by low-pressure metal–organic chemical vapor deposition
- 1 November 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 398-399, 35-40
- https://doi.org/10.1016/s0040-6090(01)01300-1
Abstract
No abstract availableThis publication has 24 references indexed in Scilit:
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