Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope
- 1 September 1979
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (9), 6020-6022
- https://doi.org/10.1063/1.326677
Abstract
Electron beam damage to thin‐film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin‐film SiO2.Keywords
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