A dual-source low-energy mass-analysed ion beam system for semiconductor epitaxy and novel materials growth
- 1 July 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 59-60, 312-315
- https://doi.org/10.1016/0168-583x(91)95230-b
Abstract
No abstract availableKeywords
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