Low temperature pulsed plasma deposition: III. A method for the deposition of aluminium and tin at room temperature
- 1 October 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 191 (1), 135-145
- https://doi.org/10.1016/0040-6090(90)90279-m
Abstract
No abstract availableKeywords
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