Plasma modification of polycarbonates
- 1 July 2001
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 142-144, 449-454
- https://doi.org/10.1016/s0257-8972(01)01134-3
Abstract
No abstract availableKeywords
Funding Information
- Grantová Agentura České Republiky (106/96/K245, 202/00/P037)
- Ministry of Education (J07/98:143100003, OC 527.20, VS96084)
This publication has 8 references indexed in Scilit:
- A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactorThin Solid Films, 2000
- Ion energy distributions in rf sheaths; review, analysis and simulationPlasma Sources Science and Technology, 1999
- Protection coatings for polycarbonates based on PECVD from organosilicon feedsVacuum, 1998
- Direct observation of water incorporation in PECVD SiO2 films by UV-Visible ellipsometryThin Solid Films, 1997
- Radio-Frequency Hexamethyldisiloxane Plasma Deposition: A Comparison of Plasma- and Deposit-ChemistryPlasmas and Polymers, 1997
- Measurement of electron energy distribution in low-pressure RF dischargesPlasma Sources Science and Technology, 1992
- Interactive personal-computer data analysis of ion backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1992
- Critical evaluation of conditions of plasma polymerizationJournal of Polymer Science: Polymer Chemistry Edition, 1978