Study of ZrO2–Y2O3 films prepared by rf magnetron reactive sputtering
- 12 December 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 377-378, 32-36
- https://doi.org/10.1016/s0040-6090(00)01395-x
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Metal-organic vapor deposition of YSZ electrolyte layers for solid oxide fuel cell applicationsThin Solid Films, 1997
- In situ reflection high energy electron bombardment analysis of biaxially oriented yttria-stabilized zirconia thin film growth on amorphous substratesThin Solid Films, 1997
- EB-PVD Y2O3- and
CeO Y Surface and Coatings Technology, 1996 - Transmission electron microscopy investigation of biaxial alignment development in YSZ films fabricated using ion beam assisted depositionJournal of Vacuum Science & Technology A, 1996
- Residual stress in protective ZrO2 coatings produced by magnetron sputteringVacuum, 1994
- Control of Y2O3-stabilized ZrO2 thin film orientation by modified bias sputteringThin Solid Films, 1994
- Determination of cubic-tetragonal phase boundary in Zr1−XYXO2−X/2 solid solutions by Raman spectroscopyJournal of Applied Physics, 1993
- Determination of the thickness and optical constants of amorphous siliconJournal of Physics E: Scientific Instruments, 1983
- Vacuum evaporated films of aluminum fluorideThin Solid Films, 1970
- The tension of metallic films deposited by electrolysisProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1909