Chemical Analysis of Surfaces by Total-Reflection-Angle X-Ray Spectroscopy in RHEED Experiments (RHEED-TRAXS)
- 1 June 1985
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 24 (6A), L387
- https://doi.org/10.1143/jjap.24.l387
Abstract
A new method for chemical analysis of surfaces by total-reflection-angle X-ray spectroscopy in RHEED experiments (RHEED-TRAXS) has been developed. When the X-ray take-off angle is set to be the critical angle for total reflection of the characteristic X-ray emitted from the deposited atoms on surfaces, the detection efficiency for the deposit becomes drastically higher owing to the refraction effect of the X-ray. This enhancement of surface sensitivity is demonstrated with Ag on Si(111). The smallest detectable amount of Ag is about 0.01 monolayer or less. This sensitivity is comparable to or higher than that of AES.Keywords
This publication has 8 references indexed in Scilit:
- Chemical Analysis of Surface by Fluorescent X-Ray Spectroscopy Using RHEED-SSD MethodJapanese Journal of Applied Physics, 1980
- An Investigation of the Si(111) 7×7 Surface Structure by RHEEDJapanese Journal of Applied Physics, 1980
- A kinetic study of the initial oxidation of the Ni(110) surface by RHEED and X-ray emissionSurface Science, 1977
- Some New Techniques in Reflection High Energy Electron Diffraction (RHEED) Application to Surface Structure StudiesJapanese Journal of Applied Physics, 1977
- A kinetic study of the initial oxidation of the Ni(001) surface by RHEED and x-ray emissionSurface Science, 1976
- X-RAY emission measurements of oxygen on the (0001) and (10
- Quantitative X-Ray Emission Analysis of Thin Oxide Films on TantalumJournal of Applied Physics, 1971
- REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION AND X-RAY EMISSION ANALYSIS OF SURFACES AND THEIR REACTION PRODUCTSApplied Physics Letters, 1967