Correlation between process conditions, chemical composition and morphology of MoS2films prepared by RF planar magnetron sputtering
- 14 August 1986
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 19 (8), 1575-1585
- https://doi.org/10.1088/0022-3727/19/8/025
Abstract
No abstract availableKeywords
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