An investigation of the pulse characteristics on deposition rate of reactively sputtered titanium dioxide films synthesised with a low-frequency modulation of the discharge current
- 1 October 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 94-95, 339-344
- https://doi.org/10.1016/s0257-8972(97)00457-x
Abstract
No abstract availableKeywords
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