Characteristics of a thermionically assisted triode ion-plating system
- 19 June 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 80 (1-3), 41-48
- https://doi.org/10.1016/0040-6090(81)90204-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Deposition of Ti-N compounds by thermionically assisted triode reactive ion platingThin Solid Films, 1980
- Influence of the deposition parameters on the structure of ion-plated chromiumThin Solid Films, 1979
- Grain structure of ion-plated coatingsThin Solid Films, 1978
- Physical vapor deposition of chromium and titanium nitrides by the hollow cathode discharge processThin Solid Films, 1978
- Soft Vacuum Vapour DepositionTransactions of the IMF, 1976
- Structures of Gold Thin Films Formed by Ion PlatingJapanese Journal of Applied Physics, 1974
- Sputtering Multilayered Conductor FilmsJournal of Vacuum Science and Technology, 1971