Growth and Properties of TiCl4‐Derived CVD Titanium Oxide Films at Different CO2/H2 Inputs
- 16 October 2003
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 9 (5), 265-271
- https://doi.org/10.1002/cvde.200306245
Abstract
No abstract availableKeywords
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