Laser microreaction for deposition of doped silicon films
- 15 December 1981
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 39 (12), 957-959
- https://doi.org/10.1063/1.92624
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Laser chemical technique for rapid direct writing of surface relief in siliconApplied Physics Letters, 1981
- Laser photochemical microalloying for etching of aluminum thin filmsApplied Physics Letters, 1981
- Laser-induced chemical vapor deposition of polycrystalline Si from SiCl4Applied Physics Letters, 1980
- Abstract: Laser chemical vapor deposition of metals and insulatorsJournal of Vacuum Science and Technology, 1979
- Periodic regrowth phenomena produced by laser annealing of ion-implanted siliconApplied Physics Letters, 1978
- Chemical vapor deposition of silicon using a CO2 laserApplied Physics Letters, 1978
- The Kinetics of Silicon Deposition on Silicon by Pyrolysis of SilaneJournal of the Electrochemical Society, 1974
- Epitaxial Growth of Silicon from the Pyrolysis of Monosilane on Silicon SubstratesJournal of the Electrochemical Society, 1963