Fabrication of assembled micromechanical components via deep X-ray lithography
- 9 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
A variant of deep X-ray lithography, the LIGA process, is described. The fundamental processing sequence has been augmented with a locally defined sacrificial polyimide layer. This requires alignment of the X-ray mask to the optically defined sacrificial pattern via specially developed align-and-clamping jigs. The end results of this process are either fully unsupported metal structures or components which are locally attached to the substrate. Attempts to use this type of processing to produce assembled devices have been successful. Thus, free gears and fully attached shafts have been connected to form a nickel gear box. More complex assembly experiments have been completed successfully and are encouraging enough to pursue this approach further.<>Keywords
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