Plasma oxidation of silicon
- 1 June 1982
- journal article
- Published by IOP Publishing in Plasma Physics
- Vol. 24 (6), 605-614
- https://doi.org/10.1088/0032-1028/24/6/003
Abstract
A brief review of the techniques used to oxidise silicon in oxygen discharges is given and a series of experiments that have been carried out to identify the oxidizing species are described. There is strong evidence to suggest that the negative ion O- is responsible for the observed phenomenon.Keywords
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