Substrate temperature dependence of SiH concentration in silane plasmas for amorphous silicon film deposition
- 1 October 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 94 (1), 5-10
- https://doi.org/10.1016/s0022-3093(87)80254-5
Abstract
No abstract availableKeywords
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