Microfabrication: LIGA-X and applications
- 1 September 2000
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 164 (1-4), 97-110
- https://doi.org/10.1016/s0169-4332(00)00354-8
Abstract
No abstract availableThis publication has 79 references indexed in Scilit:
- Micro Electro Mechanical Systems: From Research to ApplicationsJapanese Journal of Applied Physics, 1998
- Transparent masks for aligned deep x-ray lithography/LIGA: low-cost high-performance alternative using glass membranesPublished by SPIE-Intl Soc Optical Eng ,1998
- Surface micromachining for microelectromechanical systemsProceedings of the IEEE, 1998
- High-aspect-ratio micromachining via deep X-ray lithographyProceedings of the IEEE, 1998
- In the flow with MEMSIEEE Circuits and Devices Magazine, 1998
- High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMSSensors and Actuators A: Physical, 1998
- A path: from electroplating through lithographic masks in electronics to LIGA in MEMSElectrochimica Acta, 1997
- LIGA and related technologies for industrial applicationSensors and Actuators A: Physical, 1996
- Three-dimensional microfabrication using synchrotron radiationNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1991
- Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)Microelectronic Engineering, 1986